Clean Room

The Cleanroom facilities occupy the entire Level 1 of the LCN, which  is approximately 17m by 20m.  The Cleanroom has 225 m² of controlled space, and the associated service areas occupy 100 m².  This area  is organised into 3 Tunnels and an Electron Beam Lithography room.  It is rated as Class 1000 (ISO 6) with selected Class 100 (ISO 5) locations above critcal equipment.  This means that dust and other air-borne contaminates are controlled to specified low levels.  These ultra-clean conditions allow precision fabrication and characterisation of nanostructured devices.

Tunnel 1 is the main location for the plasma tools.

Tunnel 2 is where optical photolithography and ebeam resist processing is carried out. In this area we have Resist spinners, Optical Mask Aligners, Microscope, a Surface profiler, Wet Benches and Fume Hoods.

Tunnel 3 has Characterisation tools such as Ellipsometers, FTIR and Four point Probe, the Edwards Physical vapour deposition tools, including E-Beam, and a selection of Furnaces. 

The Electron Beam Lithography room contains a 'Raith 150-TWO' EBL tool, and AFM.

Further facilities in LCN include a Back End Laboratory is located on Level 2 for cutting and bonding operations, and a separate 66 m² Class 10,000 (ISO 7) cleanroom on the B2 Level  where Focused Ion Beam tools are installed.

Please explore this site to get further information about  Cleanroom Safety and how to get Trained to use it.  Further pages explain how to Reserve and Pay for equipment or time.  The  Working Hours are from 09:00 to 23:00.